Articles
  • Effect of pyrolysis temperature on Bi4Ti3O12/MgO(100) structures prepared by chemical solution deposition 
  • Ju-Hyun Jeonga, Young-Hwan Leeb and K.S. Hwangc,*
  • a Department of Ophthalmic Optics, Konyang University, 685 Gasuwon-dong, Seo-gu, Daejeon 302-718, Korea b Department of Automobile, Chunnam Techno College, 285 Okgwa-ri, Okgwa-Myeon, Gokseong-gun, Jeollanam-do 516-911, Korea c Department of Applied Optics and Institute of Photoelectronic Technology, Nambu University, 864-1 Wolgye-dong, Gwangsangu, Gwangju 506-824, Korea
Abstract
Epitaxially grown Bi4Ti3O12 thin films on MgO(100) substrates were prepared by a chemical solution deposition process using metal naphthenates as the starting materials. A homogeneous Bi-Ti solution with toluene was spin-coated onto the substrates and pyrolyzed at 300 degrees C, 400 degrees C and 500 degrees C for 10 minutes in air. Final annealing was performed at 750 degrees C for 30 minutes in air. The effects of pyrolysis temperature on the crystallinity, epitaxy and surface morphology of the films were investigated. Highly c-axis oriented Bi4Ti3O12 thin films were confirmed by X-ray diffraction theta-2-theta scans. According to the pole-figure analysis, epitaxy of the annealed films was found to depend on the pyrolysis temperature.

Keywords: Bi4Ti3O12 thin film; MgO(100); pyrolysis; epitaxy

This Article

  • 2007; 8(2): 110-113

    Published on Apr 30, 2007

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