Articles
  • Effect of Ar dilution flow rate on LPCVD a boron-doped carbon coating from BCl3-C3H6-H2-Ar mixtures
  • Yongsheng Liu*, Litong Zhang, Laifei Cheng, Wenbin Yang and Yongdong Xu
  • National Key Laboratory of Thermostructure Composite Materials, Northwestern Polytechnical University, Xi'an Shaanxi 710072, People's Republic of China
Abstract
A boron-doped carbon coating was deposited from a BCl3-C3H6-H2-Ar system by LPCVD. The effects of the Ar dilution flow rate on deposition rates, morphologies, compositions and bonding states were investigated. Deposition rates were almost the same, about 250 nm/h with different Ar dilution flow rate. Surface morphologies were also almost the same. The flat conchoidal aspect of the fracture surface transformed to a laminated structure with an increase in the Ar dilution flow rate. The carbon concentration was above 76.3 at.%, and the boron concentration was less than 17.9 at.%. The boron concentration increased with an increase in the Ar dilution flow rate, corresponding to a decreasing carbon concentration. The main bonding state of boron was B-sub-C and BC2O. The whole deposition process was dominated by a PyC formation reaction, which led to almost the same deposition rate with different Ar dilution flow rates.

Keywords: boron-doped carbon, Low pressure chemical vapor deposition, Dilution gas, Deposition rate, Morphologies and compositions

This Article

  • 2009; 10(3): 257-262

    Published on Jun 30, 2009

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