Articles
  • High temperature oxidation of WC-ZrN superhard nanolayered film
  • Hwa-Shin Leea, Seon-Jin Kimb, Sang-Hwan Baka and Dong-Bok Leea,*
  • a School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 440-746, Korea b Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
Abstract
The high-temperature oxidation behavior of WC-ZrN superhard nanolayered film deposited on steel was studied at 600 oC for up to 10 h in air. The oxide scale consisted primarily of β-ZrO2. During oxidation, C and N escaped from the film into the air, while oxygen from the air diffused into the film. Substrate elements such as Fe and Cr diffused outwards toward the oxide surface. The oxidation of the WC-ZrN film resulted in the destruction of the original nanolayers. The WC-ZrN film displayed poor oxidation resistance, because of the formation of β-ZrO2, which formed together with some amount of W-oxides.

Keywords: Tungsten carbide, Zirconium nitride, Film, Nanolayer, Oxidation.

This Article

  • 2008; 9(5): 517-521

    Published on Oct 31, 2008

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