Nanometer scale multilayers have been fabricated by pulsed double-cathodic arc deposition with varying thickness of each layer from a few to nanometers and examined by cross-sectional transmission electron microscopy. Computer simulations were performed to obtain a better understanding at least of the nano-scale deposition of multilayers during the cathodic arc deposition process and for comparison with the experimental results. The experimental results are in good agreement with those of simulations suggesting that the limit of the bilayer period of the ultra-thin multilayers is about 3 nm.

Keywords: pulsed cathodic arc, multilayers and TRIDYN