Articles
  • Effect of thickness on properties of ZnO film prepared by direct current reactive magnetron sputtering method
  • C.-S. Baeka,b, D. H. Kimc, H. H. Kimb and K.-J. Lima,*
  • a College of Electrical and Computer Engineering, Chungbuk National University, Cheongju, Chungbuk 361-763, Korea b Department of Display Engineering Division, Doowon Technical University College, Paju, Kyonggi 413-861, Korea c Department of Physics, Dongguk University, Seoul 100-715, Korea
Abstract
Effect of thickness on ZnO properties including the compositional ratio and crystallinity has been systematically investigated using a variety of characterization tools of x-ray diffraction, field emission scanning electron microscopy, x-ray fluorescence and x-ray photoelectron spectroscopy. Interestingly, it was observed that ZnO films below 80 nm in thickness were in oxygen deficiency, while the oxygen ratio was increased in the films above the thickness, although the compositional ratio of ZnO film was not linearly varied with increasing film thickness. Also, ZnO crystallinity, which is characterized by (002) diffraction pattern, was clearly improved with increasing film thickness. The properties of ZnO film with different sputtering time and the nature of direct current reactive sputtering process were discussed in terms of compositional ratio, especially oxygen ratio in ZnO film.

Keywords: ZnO, Crystallinity, Compositional ratio, Films

This Article

  • 2012; 13(S2): 403-406

    Published on Nov 30, 2012

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