Articles
  • Anisotropic growth of aluminum nitride nanostructures for a field emission application
  • Sang-Wook Ui and Sung-Churl Choi*
  • Division of Materials Science & Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791, Korea
Abstract
One-dimensional single-crystalline AlN nanostructures, which have a tip size of < 20 nm, were synthesized by a HVPE (halide vapor-phase epitaxy) system. The tip size and shape depend on the HCl flow rate. As the HCl flow rate increases, the tip size of the AlN nanostructure decreases. The AlN nanostructures were grown along the c-axis and preferentially oriented with their growth direction perpendicular to the substrate. The morphology and crystallinity of AlN nanorods were characterized by SEM and XRD. The chemical composition was analyzed by energy-dispersive X-ray spectroscopy in the SEM. The field emission measurements show that the turn-on field and field enhancement factor (β) are 5.6 V/μm at a field emission current density (J) of 10 μA/cm2 and 2092, respectively.

Keywords: AlN, Nanowire, Nanorod, Field emission, HVPE, CVD

This Article

  • 2012; 13(6): 775-777

    Published on Dec 31, 2012

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